CVD Equipment (NASDAQ:CVV) Stock Crosses Above Two Hundred Day Moving Average – Should You Sell?

CVD Equipment Corporation (NASDAQ:CVV)’s share price passed above its 200-day moving average during trading on Monday . The stock has a 200-day moving average of $3.57 and traded as high as $4.19. CVD Equipment shares last traded at $3.99, with a volume of 38,220 shares changing hands.

Analyst Upgrades and Downgrades

Separately, Weiss Ratings restated a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One equities research analyst has rated the stock with a Sell rating, According to data from MarketBeat, CVD Equipment presently has an average rating of “Sell”.

CVD Equipment Stock Performance

The stock has a market cap of $27.69 million, a price-to-earnings ratio of -199.40 and a beta of 0.96. The business has a 50-day simple moving average of $3.93 and a two-hundred day simple moving average of $3.57.

Institutional Investors Weigh In On CVD Equipment

Several hedge funds and other institutional investors have recently added to or reduced their stakes in CVV. Dimensional Fund Advisors LP lifted its position in CVD Equipment by 5.2% during the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after buying an additional 3,556 shares in the last quarter. Citadel Advisors LLC grew its holdings in shares of CVD Equipment by 93.6% in the 3rd quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after acquiring an additional 20,011 shares in the last quarter. Finally, DRW Securities LLC acquired a new stake in shares of CVD Equipment in the fourth quarter valued at about $45,000. 31.59% of the stock is currently owned by institutional investors and hedge funds.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.